Gen Art invites you to compete in the 11th Annual Styles International Design Competition, its provocative program for emerging fashion designers. Twenty five finalists will be chosen from over 800 entrants for a chance to present their looks at a high profile New York Fashion Event in May and have a chance to win a $5,000 Award for Design Excellence in five categories:
- Women’s Ready to Wear
- Women’s Eveningwear
- Menswear
- Women’s Avant-garde
- Accessories
Entries will be accepted until 11:59pm March 17, 2009.
Submissions will be reviewed at a pre-selection event in mid-April by top editors and buyers from Vogue, Teen Vogue, Elle, WWD, Barney’s, Neiman Marcus, Opening Ceremony and more.
At the event, a Fashion Panel, which has included designers Diane von Furstenberg, Norma Kamali, Betsey Johnson, Cynthia Rowley, Kate Spade, Michael Fink of Saks Fifth Avenue, Tim Gunn of Project Runway and stylist Patricia Field, will judge the designs and select a winner from each category. Styles has been the New York debut for a decade of fashion stars such as Rodarte, Peter Som, Duckie Brown, Hannah Marshall, Jeffrey Chow and Obedient Sons.
Finalists will be notified by phone by April 8th, 2009. Due to the large number of applicants we can only notify the Finalists directly.
To apply by mail please download a printable version of the application. All mailed entries must be post-marked by March 17, 2009
